MEMS Lab Equipment

1-Desiccator

Application: degassing the Solvents like PDMS to create molds for micro- fluidic services
Specifications:
۳ Lits Volume

2-DC sputtering machine

Application: deposition of thin conductive layers like Au,Cr,Ni etc. on wafers
Specifications:
Maximum Wafer Size: 4″
Targets: Au,Cr,Ni
Maximum deposited layer thickness: 400 nm

3-Mask Writer

Application: creating binary masks from raw chrome masks
Specifications:
Maximum mask size: 5″x5″
Minimum feature size: ۲µm
Exposure light wavelength: X=350-600nm
Programmable

Wet Etching Table

Application: removing bulk of materials such as Si,SiO2,Si3N
Specifications:
Maximum Wafer size: 4″
Maximum Temp: 80°C
Ultrasonic Agitation

4-Optical Microscope

Application: visual inspection,measurement,image capturing
Specifications:
Magnification: 4,10,20,50
Capability to record movie & image

Scale

Application: Weighing Chemicals and Solutions
Specifications:
Measurement range: 0.01 – ۳۰۰gr
Precision: 0.01 gr

Contact Printer

Application: transfering patterns from binary masks to Wafers coated with photoresist
Specifications:
Maximum Wafer size: 4″
Resolution: <50µm
Exposure light wavelength: X=350-420nm
Equipped with hotplate
Temp & exposure control capability

Vacuum Oven

Application: Degassing & stress relief
Specifications:
Temp control range: 5 – ۲۰۰oc
Temp precision: ±۱oc
Vacuum control range: 10 – ۱۱۰۰ bar
Vacuum precision: 1 mbar
Programmable

Profiler Machine

Application: measuring surface profile in X-Z direction
Specifications:
Height measurement range:10A – ۱mm
Height measurement resolution: 10A
X-Y range: ۵cm x 5cm

Electroplating Power Supply

Application: deposition of thick layers of conductive metals on silicon surface up to 50 mm
Specifications:
Current range: 0-5 A
Resolution: 0.001 A
Programmable

Rotatory Evaporator

Application: mixing volatile solutions and resins
Specifications:
Solvent tank volume: 1lit

Ultrosonic

Etching tank volume: 4 lit
Ultrosonic: 0 – 400 W
Temp control range: 25 – 80oc
RPM: 200 rpm

High Precision Scale

Application: Precision weight measurement for etch rate,titration,…
Specifications:
Max. measurable weight: 210 gr
Resolution: 0.1 mg